铜电解阴极钛板碳化硅悬浮液超声波协同清洗研究

Research on ultrasonic synergistic cleaning of copper electrode cathode titanium plate silicon carbide suspension

  • 摘要: 铜电解阴极钛板作为铜电解工艺的重要组成部分,其表面质量对电解质量和效率及钛板本身使用寿命有显著影响。针对此问题,采用碳化硅悬浮液超声波协同清洗技术对钛板进行简单、高效、环保的表面处理。通过铝箔腐蚀法探究了最佳清洗参数,分析了清洗过程中的协同效应及其作用机理。通过SEM+EDS和接触角测量仪对钛板表面清洁度、微观形貌和湿润性进行表征和评价。结果表明:距离换能器78 mm、碳化硅颗粒质量分数为0.05%,粒径为70 nm、pH值为中性、温度为55 ℃时清洗效果最佳;碳化硅悬浮液作为清洗介质,其协同效应可以明显提高清洗效率,改善钛板表面质量;清洗前后的对比表明,协同清洗能够有效地去除钛板表面的污染物,提高表面洁净度和湿润性,恢复钛板表面微观形貌及金属光泽。研究为优化钛板清洗工艺提供参考依据。

     

    Abstract: The copper electroplating cathode titanium plate, being an essential constituent of the copper electroplating process, and its surface quality significantly impacts the electrolytic efficiency, quality, and lifespan of the titanium plates themselves. In response to this question, a simple, efficient, and environmentally friendly surface treatment for the titanium plate is employed, utilizing ultrasonic synergistic cleaning technology with a silicon carbide suspension. The optimal cleaning parameters were investigated through an aluminum foil corrosion method, and an analysis of the synergistic effects during the cleaning process and their underlying mechanisms was conducted. Surface cleanliness, micro-morphology and wettability of titanium plates were characterized and evaluated by SEM+EDS and contact angle measurement. The results showed that the best cleaning effect was achieved at a distance of 78 mm from the transducer, a silicon carbide particle mass fraction of 0.05%, a particle size of 70 nm, a neutral pH, and a temperature of 55°C. The synergistic effect of silicon carbide suspension as a cleaning medium can significantly increase the cleaning efficiency and improve the surface quality of titanium plates. Comparison before and after cleaning shows that synergistic cleaning can effectively remove the contaminants on the surface of titanium plate, improve the surface cleanliness and wettability, and restore the surface micro-morphology and metallic luster of titanium plate. The study provides a reference basis for optimizing the cleaning process of titanium plate.

     

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