微细直写掩膜电解加工非晶合金平面微线圈工艺研究

Microfine direct-write mask electrolytic processing of amorphous alloy planar microcoils

  • 摘要: 针对掩膜电解加工工艺固化、流程复杂等问题,提出一种基于微细直写聚合物材料的图案化掩膜电解加工方法。对直写掩膜工艺应用于微细电解加工平面线圈工艺进行研究。采用单因素法获得了直写加工参数对掩膜的影响规律。采用正交实验获得了加工电压、阴极振动频率和占空比等工艺参数对成形精度的规律。建立了加工微结构尺寸的预测模型,利用优化的工艺参数在厚度30 μm合金薄片上加工出宽度为300 μm平面微线圈结构,通过网络分析仪对电流传感效应进行检测,获得了阻抗变化率为3.46%的响应。证明了直写掩膜应用于微细掩膜电解加工的可行性。

     

    Abstract: Aiming at the current mask electrolytic processing process curing, process complexity and other problems, a patterned mask electrolytic processing method based on microfine direct-write polymer materials is proposed. The application of the direct-write mask process to the microfine electrolytic machining planar coil process is investigated. The influence law of direct-write processing parameters on the mask is obtained using the one-factor method. The laws of process parameters such as processing voltage, cathode vibration frequency and duty cycle on forming accuracy were obtained using orthogonal experiments. A prediction model for the dimensions of the processed microstructures was established, and a planar microcoil structure with a width of 300 μm was processed on a thin alloy sheet with a thickness of 30 μm using the optimized process parameters, and a response with an impedance change rate of 3.46% was obtained by a network analyzer for the detection of the current sensing effect. The feasibility of direct-write mask applied to microfine mask electrolytic processing is demonstrated.

     

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